cas 2222384-17-8|| where to buy 4,4,5,5,6,6-hexafluoro-1lambda6,3lambda6-dithia-2-azanidacyclohexane 1,1,3,3-tetraoxide;(4-methoxy-3,5-dimethylphenyl)-dimethylsulfanium

Название продукции:4,4,5,5,6,6-hexafluoro-1lambda6,3lambda6-dithia-2-azanidacyclohexane 1,1,3,3-tetraoxide;(4-methoxy-3,5-dimethylphenyl)-dimethylsulfanium

IUPAC Name:(4-methoxy-3,5-dimethylphenyl)dimethylsulfanium; 4,4,5,5,6,6-hexafluoro-1,1,3,3-tetraoxo-1λ⁶,3λ⁶,2-dithiazinan-2-ide

: CAS：2222384-17-8; Молекулярная формула：C14H17F6NO5S3; Чистота：95%+

: Номер в каталоге：CM1043807; Молекулярная масса：489.46

Упаковочная единица	Доступно для заказа	Цена ($)	Количество

Запрос: sales@chemenu.com

Только для использования в НИОКР..

Форма запроса

Химическое название

Номер CAS

Количество*

Необходимые спецификации*
(% пробы, категория материала и т.д.)

Контактное лицо*

Электронная почта*

Meanwhile I'd like to create a registered account on CHEMENU.COM with the above email.

I'd like to receive emails related to products with similar structures to 2222384-17-8 regularly via the above email.

Дополнительные примечания

Verification code*

refresh

Информация о продукции

: Номер CAS:2222384-17-8; Молекулярная формула:C14H17F6NO5S3; Точка плавления:-; Smiles-код:CC1=CC(=CC(=C1OC)C)[S+](C)C.C1(C(S(=O)(=O)[N-]S(=O)(=O)C1(F)F)(F)F)(F)F; Плотность:

: Номер в каталоге:CM1043807; Молекулярная масса:489.46; Точка кипения:; Номер Mdl:; Хранение:

Category Infos

: Photoresist; Semiconductors could be termed as the most extensively utilized substance in the modern century. Polycrystalline wafers are used to make semiconductors. A single 300-mm silicon wafer may create hundreds of chips. Photoresist coatings and materials are an essential part of their fabrication as they are the main constituents of the photolithography process during the fabrication of the semiconductors. Photoresist is a mixed liquid that is sensitive to light. Its components include: photoinitiators (including photosensitizers, photoacid generators), photoresist resins, monomers, solvents and other additives. The photoresist can transfer the required fine pattern from the photomask (mask) to the substrate to be processed through photochemical reaction and photolithography processes such as exposure and development.

: Photo Acid Generator (PAG)

Форма запроса

Информация о продукции

Category Infos

Related Products